Semiconductor memory device and method of producing same

ABSTRACT

A semiconductor memory device having a high quality storage node electrode preventing for example connection failure between a contact plug and the storage node electrode, including first insulating films formed on a substrate, storage node contact holes formed in the first insulating films, storage node contact plugs buried in the storage node contact holes, a storage node electrode formed connected to the storage node contact plug, and a second insulating film formed above the first insulating film at a gap of the storage node electrode, the storage node electrode and the storage node contact plug being connected at least at part of the top surface and the side surface of the storage node contact plug or the storage node electrode and the second inter-layer insulating film being in contact at least at part of the top surface and the side surface of the second insulating film, and a method for producing the same.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to a semiconductor memory device and amethod for producing the same, more particularly relates to a dynamicrandom access memory (DRAM) or other semiconductor memory device havinga storage node electrode and a method for producing the same.

2. Description of the Related Art

In recent very large scale integrated circuits (VLSI) and othersemiconductor devices, reductions of scale of 70% have been realized inthree years. Higher degrees of integration and higher performance havebeen achieved. For example, DRAMs have a memory cell structure having aswitching use metal-oxide-semiconductor field effect transistor (MOSFET)and a memory capacitor. They have become increasingly miniaturized andreduced in size in recent years and have become increasingly large incapacity and higher in degree of integration as process drivers insemiconductor devices, for example, with DRAMs having a storage capacityof 1 Gb being announced at the academic level. Along with theminiaturization, the area of the memory cells has been reduced and thearea occupied by the memory capacitors has been reduced.

However, in order to secure a sufficient operating margin and secure atolerance to soft error due to alpha rays so as to raise the reliabilityof the stored data, the storage capacity Cs of the memory capacitor isheld at a constant value of 20 to 30 fF per bit regardless of thegeneration of the DRAM.

Accordingly, irrespective of the fact that the area occupied by thememory capacitor has been reduced along with the miniaturization, therequired amount of storage capacity Cs must be secured. Various attemptshave been made to deal with this.

For example, other than the method of reducing the thickness of acapacitor insulating film so as to increase the storage capacity, amethod has been developed of using as the capacitor insulating filmtantalum oxide (Ta₂O₅), BST, STO, or the like having a high dielectricratio in place of an ON film (or ONO film) comprising a composite filmof a silicon nitride film and a silicon oxide film so as to improve thematerials comprising the capacitor insulating film and increase thestorage capacity of the capacitor.

On the other hand, improvements have been made to the electrodestructure of the capacitor as well. Capacitors having various structureshave been developed. A memory capacitor comprises a storage nodeelectrode (electrode connected to the transistor of the capacitor), aplate electrode (grounded electrode of the capacitor), and a capacitorinsulating film between them. By increasing the surface area of thestorage node electrode and the plate electrode, it is possible toincrease the storage capacity of the capacitor.

A planer type having a planar structure has been used in the relatedart, but at present, generally the storage node electrode is madethree-dimensional to obtain a more complex shape, the side wall surfacesof the storage node electrode etc. are utilized, and therefore thesurface area of the storage node electrode is increased to increase thestorage capacity without increasing the occupied area of the capacitor.As a three-dimensional storage node electrode, there are for example astack type, a trench type, etc.

In the trench type, the storage node electrode is formed in the depthdirection with respect to the substrate, so it is necessary toinvestigate the adverse influence due to digging into the substrate. Onthe other hand, the stack type can be classified into two types, thatis, the capacitor-over-bit line (COB) and the capacitor-under-bit line(CUB) type. Among them, in the case of the COB stack type, since thecapacitor (storage node electrode) is formed after the bit line, thereis the advantage that the largest capacitor (storage node electrode)determined by the miniaturization can be formed in the cell region.

As the COB stack type described above, a variety of types have beendeveloped such as the pedestal stack type, fin type, and cylinder type(crown type). As the cylinder type, other than a type having a singlecylindrical part, a type having a double cylindrical part has beendeveloped. Further, similarly, a method of coarsening the storage nodeelectrode surface in order to increase the surface area and a method ofcontrolling the polycrystalline silicon electrode-forming temperature toproviding semispherical roughness on the surface have been developed.

Among them, the cylinder type storage node electrode can make effectiveuse of the peripheral length of the electrode as the surface area,therefore, despite the reduction of the occupied area, the storagecapacity is easily secured. This makes it one of the electrodestructures best suited to the miniaturization, increase of degree ofintegration, and reduction of size of semiconductor memory devices. Themethods for forming cylinder type storage node electrodes may be roughlyclassified into methods of forming a side wall-shaped electrode in theside wall portion of for example a recessed type oxide film and methodsof forming the electrode material at the inner wall of a recessed typeoxide film. In general, the latter enables a larger exposure margin inlithography and a larger margin with respect to the focus depth, so isadvantageous with respect to further miniaturization.

The methods of forming cylinder type storage node electrodes of therelated art, however, suffer from several problems such as a difficultyin exposing the top face of the storage node contact plug and connectionfailure between the storage node contact plug and the storage nodeelectrode and, even when there is no connection failure, inadvertentetching of the inter-layer insulating film and, in the worst case, ashort circuiting of the bit line and the storage node. These will beexplained in further detail later, along with the method of productionof the related art, with reference to the attached drawings.

SUMMARY OF THE INVENTION

An object of the present invention is to provide a DRAM or othersemiconductor memory device having a memory capacitor wherein provisionis made of a high quality storage node electrode and storage nodecontact plug enabling prevention of the connection failure between thestorage node contact plug and the storage node electrode and preventionof the removal of the insulating film below the etching stopper which isa cause of short-circuiting and a method for producing the same.

To attain the above object, according to a first aspect of the presentinvention, there is provided a semiconductor memory device comprising aplurality of memory cells each having a memory capacitor having astorage node electrode and a transistor, comprising a substrate, atransistor formed on said substrate, a first insulating film formed onsaid substrate covering said transistor, a storage node contact holeformed in said first insulating film and reaching a source and drainregion of said transistor, a storage node contact plug buried in saidstorage node contact hole, a storage node electrode formed connected tosaid storage node contact plug, a second insulating film formed abovesaid first insulating film in the gap portion of said storage nodeelectrodes, a capacitor insulating film formed above said storage nodeelectrode, and a plate electrode formed above said capacitor insulatingfilm, said storage node electrode and said storage node contact plugbeing formed connected at least at part of the top surface and sidesurface of said storage node contact plug.

That is, according to the semiconductor memory device of this aspect ofthe present invention, the storage node electrode and the storage nodecontact plug are formed connected at least at part of the top surfaceand the side surface of the storage node contact plug. In the relatedart, they were connected at only the top surface of the storage nodecontact plug, therefore when the plug loss was large, it was sometimesdifficult to sufficiently expose the top surface of the storage nodecontact plug. By connecting them at part of the top surface and the sidesurface of the storage node contact plug, it becomes possible toreliably connect the storage node electrode and the storage node contactplug.

In the semiconductor memory device of this aspect of the presentinvention, preferably said storage node electrode and said secondinsulating film are formed in contact at least at part of the topsurface and the side surface of said second insulating film. Due tothis, it becomes possible to bring the storage node electrode and thesecond insulating film in contact without generating a gap. When theinsulating film used as the mold for forming the storage node electrodeis removed with a selectivity with respect to the second insulatingfilm, the removal of the first insulating film below the secondinsulating film can be prevented.

Further, to achieve the object, according to a second aspect of thepresent invention, there is provided a semiconductor memory devicecomprising a plurality of memory cells each having a memory capacitorhaving a storage node electrode and a transistor, comprising asubstrate, a transistor formed on said substrate, a first insulatingfilm formed on said substrate covering said transistor, a storage nodecontact hole formed on said insulating film and reaching the source anddrain region of said transistor, a storage node contact plug buried insaid storage node contact hole, a storage node electrode formedconnected to said storage node contact plug, a second insulating filmformed above said first insulating film in the gap of said storage nodeelectrode, a capacitor insulating film formed above said storage nodeelectrode, and a plate electrode formed above said capacitor insulatingfilm, said storage node electrode and said second insulating film beingformed in contact at least at part of the top surface and the sidesurface of said second insulating film.

According to the semiconductor memory device of this aspect of thepresent invention, since the storage node electrode and the secondinsulating film are formed in contact at least at part of the topsurface and the side surface of the second insulating film, it becomespossible to bring the storage node electrode and the second insulatingfilm into contact without generating a gap. When the insulating filmused as a mold for forming the storage node electrode is removed with aselectivity with respect to the second insulating film, the removal ofthe first insulating film below the second insulating film can beprevented.

In the semiconductor memory device of this aspect of the presentinvention, preferably the bit line is formed above said transistor viathe insulating film and said transistor and said bit line are covered bysaid first insulating film. As the COB type capacitor (storage nodeelectrode), the largest capacitor (storage node electrode) determined bythe miniaturization can be formed on the cell region.

In the semiconductor memory device of this aspect of the presentinvention, preferably said storage node electrode is a cylinder type. Inthe cylinder type, the peripheral length of the electrode can beeffectively used as the surface area, therefore the storage capacity canbe easily secured even while reducing the occupied area thereof.

Further, to attain the above object, according to a third aspect of thepresent invention, there is provided a method for producing asemiconductor memory device comprising a plurality of memory cells eachhaving a memory capacitor having a storage node electrode and atransistor, including a step of forming a transistor on a substrate, astep of forming a first insulating film covering said transistor, a stepof opening a storage node contact hole reaching a source and drainregion of said transistor in said first insulating film, a step offorming a storage node contact plug by filling said storage node contacthole by a conductor, a step of forming a second insulating film having adifferent etching selectivity from that of said first insulating filmabove said first insulating film, a step of forming a third insulatingfilm having a different etching selectivity from that of said secondinsulating film above said second insulating film, a step of opening anopening portion acting as the mold for forming the storage nodeelectrode and exposing at least the top surface of said storage nodecontact plug in said second insulating film and said third insulatingfilm, a step of etching to selectively remove said first insulating filmand said third insulating film with respect to said second insulatingfilm to cause the bottom surface and the side wall surface of saidopening portion to retract, a step of forming the storage node electrodeconnected to said storage node contact plug while bringing it in contactwith said second insulating film by using said opening portion as amold, a step of removing said third insulating film by using said secondinsulating film as an etching stopper, a step of forming a capacitorinsulating film above said storage node electrode, and a step of forminga plate electrode above said capacitor insulating film.

That is, in the method for producing a semiconductor memory device ofthis aspect of the present invention, a transistor is formed on asubstrate, the first insulating film is formed covering the transistor,a storage node contact hole reaching the source and drain region of thetransistor is opened in the first insulating film, and the storage nodecontact hole is filled by the conductor to form a storage node contactplug.

Next, a second insulating film having a different etching selectivityfrom that of the first insulating film is formed above the firstinsulating film, and a third insulating film having a different etchingselectivity from that of the second insulating film is formed above thesecond insulating film.

Next, in the second insulating film and the third insulating film, anopening portion acting as the mold for forming the storage nodeelectrode and for exposing at least the top surface of the storage nodecontact plug is opened and the bottom surface and the side wall surfaceof the opening portion are caused to retract by etching for selectivelyremoving the first insulating film and the third insulating film withrespect to the second insulating film.

Next, a storage node electrode is formed connected to the storage nodecontact plug while bringing it in contact with the second insulatingfilm by using the opening portion as a mold, a third insulating film isremoved by using the second insulating film as an etching stopper, acapacitor insulating film is formed above the storage node electrode,and a plate electrode is formed above the capacitor insulating film.

According to the method for producing a semiconductor memory device ofthis aspect of the present invention, an opening portion acting as themold for forming the storage node electrode is opened in the secondinsulating film and the third insulating film, then the bottom surfaceand the side wall surface of the opening portion are made to retract,whereby it becomes possible to cause said bottom surface to retract sothat the storage node contact plug projects out inside the openingportion and the storage node electrode and the storage node contact plugcan be connected at least at part of the top surface and the sidesurface of the storage node contact plug. By this, it becomes possibleto reliably connect the storage node electrode and the storage nodecontact plug.

Further, it becomes possible to cause the side wall surface to retractso that said second insulating film projects out into the openingportion at the side wall surface and possible to bring the storage nodeelectrode and the second insulating film into contact without a gap and,when removing the third insulating film using the second insulating filmas an etching stopper, to prevent the removal of the first insulatingfilm below the second insulating film.

In the method for producing a semiconductor memory device of this aspectof the present invention, preferably, in the step of causing the bottomsurface and the side wall surface of said opening portion to retract,said first insulating film and said third insulating film areselectively removed with respect to the second insulating film byisotropic etching. According to the isotropic etching, the bottomsurface and the side wall surface of the opening portion can be made toretract.

In the method for producing a semiconductor memory device of this aspectof the present invention, preferably, in the step of forming saidstorage node contact plug, said storage node contact plug is formed sothat the height of the top surface of said storage node contact plugmatches the height of the surface of said first insulating film.Alternatively, preferably, the step of forming said storage node contactplug includes a step of forming a conductor on the entire surface whilefilling said storage node contact hole and a step of removing saidconductor formed on the outside of said storage node contact hole bypolishing. By this, a storage node contact plug can be formed whilesuppressing the plug loss.

In the method for producing a semiconductor memory device of this aspectof the present invention, preferably the step of forming said storagenode electrode includes a step of forming a storage node electrode uselayer connected to said storage node contact plug while bringing it incontact with said second insulating film by using said opening portionas a mold, a step of forming a fourth insulating film above said storagenode electrode use layer, and a step of dividing said storage nodeelectrode use layer into individual storage node electrodes by polishingfrom the top surface of said fourth insulating film, and in the step ofremoving said third insulating film by using said second insulating filmas an etching stopper, said fourth insulating film is simultaneouslyremoved. It is possible to use the third insulating film and the fourthinsulating film as layers for forming the storage node electrode andprocessing the same.

In the method for producing a semiconductor memory device of this aspectof the present invention, preferably said first insulating film and saidthird insulating film are formed by silicon oxide and said secondinsulating film is formed by silicon nitride. Due to this, the bottomsurface and the side wall surface of the opening portion acting as themold of the storage node electrode can be caused to retract by removingthe first insulating film and the third insulating film by etching withselectivity with respect to the second insulating film. Further, thethird insulating film can be removed by using the second insulating filmas an etching stopper.

BRIEF DESCRIPTION OF THE DRAWINGS

The above object and features of the present invention will become moreapparent from the following description of the preferred embodimentsgiven with reference to the accompanying drawings, wherein:

FIG. 1A is a sectional view of a semiconductor memory device accordingto an embodiment of the present invention and FIG. 1B is an enlargedview of a region X in FIG. 1A;

FIGS. 2A and 2X are sectional views of steps in the method for producinga semiconductor memory device according to an embodiment of the presentinvention, in which:

FIG. 2A shows the state up to the step of forming an element isolationinsulating film;

FIG. 2B shows the state up to the step of forming a transistor;

FIG. 2C shows the state up to the step of forming a first mask layer;

FIG. 2D shows the state up to the step of forming a concavity for astorage node contact hole;

FIG. 2E shows the state up to the step of forming a layer for a firstside wall mask:

FIG. 2F shows the state up to the step of forming a first side wall masklayer;

FIG. 2G shows the state up to the step of opening a first storage nodecontact hole;

FIG. 2H shows the state up to the step of forming a layer for a firststorage node contact plug;

FIG. 2I shows the state up to the step of forming a second inter-layerinsulating film;

FIG. 2J shows the state up to the step of forming a bit line;

FIG. 2K shows the state up to the step of forming a fourth inter-layerinsulating film;

FIG. 2L shows the state up to the step of forming a second mask layer;

FIG. 2M shows the state up to the step of forming a layer for a secondside wall mask;

FIG. 2N shows the state up to the step of forming a second side wallmask layer;

FIG. 2O shows the state up to the step of opening a second storage nodecontact hole;

FIG. 2P shows the state up to the step of forming a layer for a secondstorage node contact plug;

FIG. 2Q shows the state up to the step of forming a second storage nodecontact plug;

FIG. 2R shows the state up to the step of forming a layer for forming afirst storage node;

FIG. 2S shows the state up to the step of forming an opening portionacting as the mold of the storage node electrode;

FIG. 2T shows the state up to the step of causing the bottom surface andthe side wall surface of the opening portion acting as the mold of thestorage node electrode to retract;

FIG. 2U shows the state up to the step of forming a layer for forming asecond storage node;

FIG. 2V shows the state up to the step of dividing the storage nodeelectrode;

FIG. 2W shows the state up to the step of removing the layer for formingthe first and second storage nodes; and

FIG. 2X shows the state up to the step of forming the capacitorinsulating film;

FIG. 3A is a sectional view of the case in the embodiment where thepattern of formation of the storage node electrodes is off;

FIG. 3B is an enlarged view of the region X in FIG. 3A;

FIGS. 4A is a sectional view of a semiconductor memory device accordingto the related art and FIG. 4B is an enlarged view of the region X inFIG. 4A;

FIGS. 5A to 5L are sectional views of steps in the method for producinga semiconductor memory device according to the related art, in which:

FIG. 5A shows the state up to the step of forming a fifth inter-layerinsulating film;

FIG. 5B shows the state up to the step of forming a mask layer;

FIG. 5C shows the state up to the step of forming a layer for a sidewall mask;

FIG. 5D shows the state up to the step of forming the side wall masklayer;

FIG. 5E shows up to the step of opening a second storage node contacthole;

FIG. 5F shows the state up to the step of forming a layer for a secondstorage node contact plug;

FIG. 5G shows the state up to the step of forming the second storagenode contact plug;

FIG. 5H shows the state up to the step of forming a layer for forming afirst storage node;

FIG. 5I shows the state up to the step of forming an opening portionacting as the mold of the storage node electrode;

FIG. 5J shows the state up to the step of forming a layer for forming asecond storage node;

FIG. 5K shows the state up to the step of removing a layer for formingfirst and second storage nodes; and

FIG. 5L shows the state up to the step of forming a capacitor insulatingfilm;

FIG. 6 is a sectional view for explaining the problem of the relatedart;

FIG. 7A is a sectional view for explaining the problem in the relatedart where the pattern of formation of storage node electrodes is off andFIG. 7B is an enlarged view of the region X in FIG. 7A; and

FIG. 8A is another sectional view for explaining the problem in therelated art where the pattern of formation of storage node electrodes isoff and FIG. 8B is an enlarged view of the region X in FIG. 8A.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

Before describing the embodiments of the present invention, the relatedart and the disadvantages therein will be described with reference tothe related figures.

First, an explanation will be made of a semiconductor memory devicehaving a cylinder type storage node electrode according to the method ofthe related art and a method for producing the same by referring toFIGS. 4A to 4B to FIGS. 5A to 5L.

FIG. 4A is a sectional view of a semiconductor memory device having acylinder type storage node electrode according to the related art, andFIG. 4B is an enlarged view of a region X in FIG. 4A.

On an active region isolated by a trench type element isolationinsulating film 20 on a silicon semiconductor substrate 10, a transistorcomprising a not illustrated gate insulating film, a gate electrode Gand a source and drain diffusion layer 11 or the like is formed. A firstinter-layer insulating film 21 made of for example silicon oxide isformed above this.

A first storage node contact hole CH1 reaching the source and draindiffusion layer 11 is opened in the first inter-layer insulating film 21and buried to form a first storage node contact plug P1. Further, a notillustrated bit contact hole reaching the source and drain diffusionlayer 11 is opened in the first inter-layer insulating film 21 andburied to form a bit contact plug. Above the first inter-layerinsulating film 21, a second inter-layer insulating film 22 made of forexample silicon oxide is formed. A bit line 33 having for example apolycide structure is formed above this and connected to the bit contactplug.

A third inter-layer insulating film 23 made of for example siliconnitride is formed covering the bit line 33, a fourth inter-layerinsulating film 24 made of for example silicon oxide is formed abovethis, and a fifth inter-layer insulating film 25 made of for examplesilicon nitride is formed above this. A second storage node contact holeCH2 for exposing the top surface of the first storage node contact plugP1 is opened penetrating through the third to fifth inter-layerinsulating films (23, 24, 25) and buried to form a second storage nodecontact plug P2 connected to the first storage node contact plug P1.

Above the second storage node contact plug P2, a storage node electrode37 a made of a polycrystalline silicon containing for example aconductive impurity is formed so as to be connected to the secondstorage node contact plug P2. A capacitor insulating film 28 made of forexample an NO film (stacked insulating film of a nitride film and anoxide film) is formed covering the surface of the storage node electrode37 a. A plate electrode 38 made of polycrystalline silicon containingfor example a conductive impurity is formed above this. Thus, a memorycapacitor comprising the storage node electrode 37 a, capacitorinsulating film 28, and the plate electrode 38 is formed.

Next, an explanation will be made of the method for producing thesemiconductor memory device shown in FIGS. 4A and 4B. First, anexplanation will be made of the steps up to FIG. 5A. An elementisolation insulating film 20 is formed on a semiconductor substrate 10by for example a shallow trench isolation (STI) process, then a notillustrated gate insulating film, gate electrode G, and source and draindiffusion layer 11 are formed in the active region to form thetransistor.

Next, silicon oxide is deposited by for example a chemical vapordeposition (CVD) process, a first inter-layer insulating film 21 isformed, and a bit contact hole (not illustrated) and first storage nodecontact hole CH1 for exposing the source and drain diffusion layer 11are opened in the first inter-layer insulating film 21.

Next, the bit contact hole and the first storage node contact hole CH1are buried by polycrystalline silicon containing a conductive impurityor the like by for example a CVD process to form the bit contact plug(not illustrated) and the first storage node contact plug P1.

Next, silicon oxide is deposited by for example the CVD process to forma second inter-layer insulating film 22, and a bit line 33 having forexample a polycide structure is formed above this so as to be connectedto the bit contact plug described above.

Next, silicon nitride is deposited over the whole surface covering thebit line 33 by for example the CVD process to form the third inter-layerinsulating film 23.

Next, silicon oxide is deposited by for example the CVD process to formthe fourth inter-layer insulating film 24.

Next, silicon oxide is deposited by for example the CVD process to formthe fifth inter-layer insulating film 25.

Next, as shown in FIG. 5B, polycrystalline silicon is deposited abovethe fifth inter-layer insulating film by for example the CVD process andprocessed to the pattern of opening the second storage node contactholes to form a mask layer 34.

Next, as shown in FIG. 5C, the polycrystalline silicon is depositedabove the mask layer 34 by for example the CVD process to form a sidewall mask use layer 35.

Next, as shown in FIG. 5D, for example reactive ion etching (RIE) orother etching is applied to remove the side wall mask use layer 35 whileleaving the part covering the side wall portion of the mask layer 34 tothereby form a side wall mask layer 35 a. At this time, a mask layer 34a is formed with rounded shoulder portions.

Next, as shown in FIG. 5E, RIE or other etching is applied by using themask layer 34 a and the side wall mask layer 35 a as masks to penetratethrough the second inter-layer insulating film 22, third inter-layerinsulating film 23, fourth inter-layer insulating film 24, and fifthinter-layer insulating film 25 and open the second storage node contacthole CH2 for exposing the top surface of the first storage node contactplug P1.

Next, as shown in FIG. 5F, polycrystalline silicon or the likecontaining a conductive impurity is deposited by for example the CVDprocess over the entire surface burying the second storage node contacthole CH2 so as to be connected to the first storage node contact plug P1to form a second storage node contact plug use layer 36.

Next, as shown in FIG. 5G, this is etched back by for example RIE orother etching to remove the polycrystalline silicon deposited on theoutside of the second storage node contact hole CH2 while leaving theinside of the second storage node contact hole CH2 to form the secondstorage node contact storage node contact plug P2 (36 a).

Next, as shown in FIG. 5H, silicon oxide is deposited over the entiresurface of the second storage node contact plug P2 and the fifthinter-layer insulating film 25 by for example the CVD process to form afirst storage node forming layer 26.

Next, as shown in FIG. 5I, a resist film is formed by patterning abovethe first storage node forming layer 26 by photolithography and isetched by RIE etc. to form an opening portion H acting as a mold of thestorage node electrode.

Next, as shown in FIG. 5J, polycrystalline silicon or an amorphoussilicon containing phosphorus or another conductive impurity isdeposited over the entire surface covering the side wall of the openingportion H acting as the mold of the storage node electrode by forexample the CVD process to form a storage node electrode use layer 37connected to the second storage node contact plug P2.

Next, silicon oxide is deposited above the storage node electrode uselayer 37 while burying the opening portion H acting as the mold of thestorage node electrode by for example the CVD process to form a secondstorage node forming layer 27.

Next, as shown in FIG. 5K, for example, the second storage node forminglayer 27 and the storage node electrode use layer 37 are sequentiallyetched back from above or polished from above by a chemical mechanicalpolishing (CMP) process to form the individually divided storage nodeelectrode 37 a and the second storage node forming layer.

Next, for example fluoric acid-based wet etching is performed to removethe first storage node forming layer 26 and the second storage nodeforming layer 27. At this time, the fifth inter-layer insulating film 25made of for example silicon nitride acts as the etching stopper.

Next, as shown in FIG. 5L, after the natural oxide film on the surfaceof for example the storage node electrode 37 a is removed by the fluoricacid-based wet etching, a silicon nitride layer is formed by a rapidthermal nitridation (RTN) process and a low pressure CVD process.Further, a silicon oxide layer is formed on the surface of the siliconnitride layer by thermal oxidation treatment to form a capacitorinsulating film 28 made of an NO film (stacked insulating film of anitride film and oxide film) covering the storage node electrode 37 a.

Next, polycrystalline silicon containing a conductive impurity isdeposited by for example the CVD process to form the plate electrode 38and thus complete the capacitor having the structure shown in FIGS. 4aand 4 b. As the following steps, the upper insulating film is formed onthe entire surface covering the capacitor etc., the upperinterconnections are formed according to need, and so on to produce thedesired semiconductor memory device.

Summarizing the problem to be solved by the invention, in the abovemethod of the related art, however, in the step of forming the (second)storage node contact plug, plug loss sometimes becomes large whenetching back by RIE or other etching. Where the plug loss is large, itbecomes difficult to expose the top surface of the storage node contactplug in the patterning step of the storage node forming layer. As shownin FIG. 6, a connection failure F occurs between the storage nodecontact plug P2 and the storage node electrode 37 a.

Further, even in a case where the connection failure F is not caused,the following problem sometimes occurs. FIG. 7A is a sectional viewshowing the state up to the step of forming the storage node electrodeuse layer 37 in the method for producing the semiconductor memorydevice, and FIG. 7B is an enlarged view in the region X of FIG. 7A.Here, a case where the opening portion H is formed deviated to the leftin the figure by the amount of distance A to an extent that one end ofthe opening portion H acting as the mold of the storage node electrodeformed in the first storage node forming layer 26 is located above thestorage node contact plug P2 is shown.

As described above, where one end of the opening portion H is locatedabove the storage node contact plug P2, as shown in FIG. 8A and FIG. 8Bwhich is an enlarged view of the region X in the same figure, when forexample fluoric acid-based wet etching is applied to form the firststorage node forming layer 26, the etchant E permeates from a gapbetween the storage node contact plug P2 and the fifth inter-layerinsulating film 25 (etching stopper), the fourth inter-layer insulatingfilm 24 below the fifth inter-layer insulating film 25 etc. are removedby etching, and, in the worst case, short-circuiting of the bit line andthe storage node occurs.

In order to avoid the problem, the method of making the fifthinter-layer insulating film (etching stopper) thicker to prevent the topsurface of the storage node contact plug from becoming lower than thebottom surface of the fifth inter-layer insulating film can beconsidered, but in this case, there were the disadvantages that theentire inter-layer insulating film became thicker and the opening forexposing the storage node contact plug was liable to becomeinsufficient, so connection failure was liable to occur between thestorage node contact plug and the storage node electrode.

Below, an explanation will be made of the method for producing asemiconductor memory device according to an embodiment of the presentinvention by referring to the drawings.

The semiconductor memory device according to the present embodiment is aCOB type DRAM having a cylinder type storage node electrode. FIG. 1A isa sectional view thereof, and FIG. 1B is an enlarged view of the regionX in FIG. 1A.

One memory cell is constituted by one transistor and one memorycapacitor. m×n (five in a horizontal direction in the figure) number ofthese memory cells are arranged in the form of a matrix.

On the active region isolated by a trench type element isolationinsulating film 20 on the silicon semiconductor substrate 10, atransistor comprising a not illustrated gate insulating film, a gateelectrode G having a polycide structure comprising a stack of forexample polycrystalline silicon and tungsten silicide, a source anddrain diffusion layer 11 having for example a lightly doped drain (LDD)structure, etc. is formed. A first inter-layer insulating film 21 madeof for example silicon oxide is formed above this.

A first storage node contact hole CH1 reaching the source and draindiffusion layer 11 is opened in the first inter-layer insulating film 21and buried to form the first storage node contact plug P1. Further, anot illustrated bit contact hole reaching the source and drain diffusionlayer 11 is opened in the first inter-layer insulating film 21 andburied to form the bit contact plug. Above the first inter-layerinsulating film 21, a second inter-layer insulating film 22 made of forexample silicon oxide is formed. A bit line 33 having a polycidestructure comprising a stack of for example polycrystalline silicon andtungsten sulicide is formed above this and connected to the bit contactplug.

A third inter-layer insulating film 23 made of for example siliconnitride is formed covering the bit line 33, a fourth inter-layerinsulating film 24 made of for example silicon oxide is formed abovethis, and a fifth inter-layer insulating film 25 made of for examplesilicon nitride is formed above this. The second storage node contacthole CH2 for exposing the top surface of the first storage node contactplug P1 is opened penetrating through the third to fifth inter-layerinsulating films (23, 24, 25) and buried to form the second storage nodecontact plug P2 connected to the first storage node contact plug P1.

Above the second storage node contact plug P2, a storage node electrode37 a made of for example polycrystalline silicon containing a conductiveimpurity is formed connected to the second storage node contact plug P2.Here, part of the top surface and the side surface of the second storagenode contact plug P2 is formed so as to be connected to the storage nodeelectrode 37 a. Further, the storage node electrode 37 a and the fifthinter-layer insulating film 25 are formed in contact at part of the topsurface and the side surface of the fifth inter-layer insulating film25.

The capacitor insulating film 28 made of for example the NO film(stacked insulating film of nitride film and oxide film) is formedcovering the surface of the storage node electrode 37 a and a plateelectrode 38 made of for example polycrystalline silicon containing aconductive impurity is formed above this to form a memory capacitorcomprising the storage node electrode 37 a, the capacitor insulatingfilm 28, and the plate electrode 38.

In the semiconductor memory device of the present embodiment, it becomespossible to reliably connect the storage node electrode and the storagenode contact plug by connecting them at part of the top surface and theside surface of the storage node contact plug. Further, the storage nodeelectrode and the fifth inter-layer insulating film are formed incontact at part of the top surface and the side surface of the fifthinter-layer insulating film. Due to this, when the insulating film usedas the mold for forming the storage node electrode is removed withselectivity with respect to the fifth inter-layer insulating film, theremoval of the fourth inter-layer insulating film below the fifthinter-layer insulating film can be prevented. In this way, there isprovided a semiconductor memory device having a high quality storagenode electrode and storage node contact plug enabling the prevention ofconnection failure between the storage node contact plug and the storagenode electrode, the prevention of the removal of the insulating filmbelow the etching stopper, which can become a cause of short circuiting,etc.

Next, an explanation will be made of the method for producing thesemiconductor memory device shown in the above FIGS. 1A and 1B. First,as shown in FIG. 2A, an element isolation insulating film 20 is formedon a silicon semiconductor substrate 10 by for example the STI process.

Next, as shown in FIG. 2B, a not illustrated well is formed byintroducing a conductive impurity by ion implantation or the like, thena not illustrated gate insulating film, a gate electrode G having apolycide structure comprising a stack of for example polycrystallinesilicon and tungsten silicide, and a source and drain diffusion layer 11having an LDD structure are formed on an active region isolated by theelement isolation insulating film 20 by for example a thermal oxidationprocess to form a transistor. The gate electrode G functions as a wordline in the DRAM. It is shown wired in the horizontal direction in thefigure and wired at a position different from that on the cross-sectionshown in FIG. 2B.

Next, as shown in FIG. 2C, silicon oxide is deposited by for example theCVD process to form a first inter-layer insulating film 21.

Next, a silicon layer such as polycrystalline silicon or amorphoussilicon is deposited by for example the CVD process to form a first masklayer 30. The first mask layer 30 may or may not contain a conductiveimpurity.

Next, as shown in FIG. 2D, a not illustrated resist film having apattern of storage node contact holes is formed above the first masklayer 30, RIE or other etching is applied to this to penetrate throughthe first mask layer 30 a and open a concavity C for a storage nodecontact hole having a depth up to the middle of the first inter-layerinsulating film 21. For example, the first mask layer 30 is etched underconditions of an etching gas flow rate of Cl₂=75 sccm, a pressure of 400mPa, a current of 250 mA, and an RF power of −70 W, while the firstinter-layer insulating film 21 is etched under conditions of an etchinggas flow rate of C₄F₈/CO/Ar=10/300/400 sccm, a pressure of 5.3 Pa, andan RF power of 1700 W. Thereafter, the resist film is removed.

Next, as shown in FIG. 2E, a silicon layer such as polycrystallinesilicon or amorphous silicon is deposited covering the interior of theconcavity C for the storage node contact hole by for example the CVDprocess to thereby form a first side wall mask use layer 31. The firstside wall mask use layer 31 may or may not contain a conductiveimpurity.

Next, as shown in FIG. 2F, for example RIE or other etching is appliedto remove the first side wall mask use layer 31 while leaving the partcovering a side wall portion of the first mask layer 30 a so as to forma first side wall mask layer 31 a. At this time, the first mask layer 30a is shaped round at its shoulder portions. The inside of the first sidewall mask layer 31 a acts as the first storage node contact hole CH1. Byforming the first side wall mask layer 31 a in the side wall portion ofthe first mask layer 30 a, it becomes possible to open a minute contacthole.

Next, as shown in FIG. 2G, RIE or other etching is applied using thefirst mask layer 30 a and the first side wall mask layer 31 a as masksto penetrate through the first inter-layer insulating film 21 and openthe first storage node contact hole CH1 for exposing the source anddrain diffusion layer 11 of the transistor. For example, the firstinter-layer insulating film 21 is etched under conditions of an etchinggas flow rate of C₄F₈/CO/Ar/O₂=15/150/300/7 sccm, a pressure of 4 Pa.and an RF power of 1500 W.

Next, as shown in FIG. 2H, a silicon layer such as polycrystallinesilicon or amorphous silicon containing the same conductivity typeconductive impurity as that of the source and drain diffusion layer 11is deposited by for example the CVD process on the entire surface whileburying the first storage node contact hole CH1 to connect to the sourceand drain diffusion layer 11 and thereby to form the first storage nodecontact plug use layer 32.

Next, as shown in FIG. 2I, this is etched back by for example RIE orother etching and polished by a CMP process to remove thepolycrystalline silicon (or amorphous silicon) deposited on the outsideof the first storage node contact hole CH1 and leave the inside of thefirst storage node contact hole CH1 to form the first storage nodecontact plug P1 (31 b , 32 a). In the CMP process, for example, use wasmade of the polishing conditions for standard silicon oxide containingas the main components for example KOH and silica.

Next, the silicon oxide is deposited over the entire surface coveringthe top surface of the first storage node contact plug P1 by for examplethe CVD process to form a second inter-layer insulating film 22.

In the above steps, an explanation was made of the steps of opening thefirst storage node contact hole and forming the first storage nodecontact plug, but it is also preferred to simultaneously perform thesteps of opening the not illustrated bit contact hole and forming thebit contact plug.

Next, as shown in FIG. 2J, polycrystalline silicon (or amorphoussilicon) containing the same conductivity type conductive impurity asthat of the source and drain diffusion layer 11 and tungsten silicideare deposited by for example the CVD process and processed to a patternof the bit line to form a bit line 33 having a polycide structure of alower bit line 33 a made of polycrystalline silicon (or amorphoussilicon) and an upper bit line 33 b made of tungsten silicide. Here, thebit line 33 is formed so as to be connected to the not illustrated bitcontact plug.

Next, as shown in FIG. 2K, silicon nitride is deposited on the entiresurface covering the bit line 33 by for example the CVD process to forma third inter-layer insulating film 23.

Next, silicon oxide is deposited by for example the CVD process to forma fourth inter-layer insulating film 24.

Next, as shown in FIG. 2L, polycrystalline silicon (or amorphoussilicon) is deposited above the fourth inter-layer insulating film 24 byfor example the CVD process and processed to the pattern for opening thesecond storage node contact hole to form the second mask layer 24. Thesecond mask layer 34 may or may not contain a conductive impurity

Next, as shown in FIG. 2M, polycrystalline silicon (or amorphoussilicon) is deposited above the second mask layer 24 by for example theCVD process to form the second side wall mask use layer 35. The secondside wall mask use layer 35 may or may not contain a conductiveimpurity.

Next, as shown in FIG. 2N, for example RIE or other etching is appliedto remove the second side wall mask use layer 35 while leaving the partcovering the side wall portion of the second mask layer 34 to form asecond side wall mask layer 35 a. At this time, the second mask layer 34a is shaped round in its shoulder portions.

Next, as shown in FIG. 20, RIE or other etching is applied using thesecond mask layer 34 a and the second side wall mask layer 35 a as masksto penetrate through the second inter-layer insulating film 22, thirdinter-layer insulating film 23, and fourth inter-layer insulating film24 and open the second storage node contact hole CH2 for exposing thetop surface of the first storage node contact plug P1.

Next, as shown in FIG. 2P, polycrystalline silicon (or amorphoussilicon) containing the same conductivity type conductive impurity asthat of the first storage node contact plug P1 is deposited over theentire surface by for example the CVD process while burying the secondstorage node contact hole CH2 so as to be connected to the first storagenode contact plug P1 and thus form the second storage node contact pluguse layer 36.

Next, as shown in FIG. 2Q, this is etched back by for example RIE orother etching and polished by the CMP process to remove thepolycrystalline silicon (or amorphous silicon) deposited on the outsideof the second storage node contact hole CH2 while leaving the insideportion of the second storage node contact hole CH2 to form the secondstorage node contact plug P2 (36 b). Here, by removing thepolycrystalline silicon or the like deposited on the outside of thesecond storage node contact hole CH2 by the CMP process, the secondstorage node contact plug P2 can be formed so that the height of the topsurface of the second storage node contact plug matches with the heightof the surface of the fourth inter-layer insulating film 24, so almostno plug loss occurs.

Next, as shown in FIG. 2R, silicon nitride is deposited by for examplethe CVD process to form a fifth inter-layer insulating film 25.

Next, silicon oxide is deposited over the entire surface above the fifthinter-layer insulating film 25 by for example the CVD process to form afirst storage node forming layer 26.

Next, as shown in FIG. 2S, a resist film is formed by patterning abovethe first storage node forming layer 26 by photolithography and RIE orother etching applied to penetrate through the first storage nodeforming layer 26 and the fifth inter-layer insulating film 25 and formthe opening portion H for exposing the top surface of the second storagenode contact plug P2. Here, the opening portion H becomes the mold forthe storage node electrode. For example, the first storage node forminglayer 26 is etched under conditions of an etching gas flow rate ofC₄F₈/CO/Ar/O₂=8/150/200/3 sccm, a pressure of 5.3 Pa, and an RF power of1700 W, while the fifth inter-layer insulating film 25 is etched underconditions of an etching gas flow rate of CHF₃/CO/O₂=40/160/14 sccm, apressure of 5.3 Pa, and an RF power of 1000 W.

Next, as shown in FIG. 2T, for example NH₄F or other fluoric acid-basedwet etching is used to selectively etch and remove the first storagenode forming layer 26 and the fourth inter-layer insulating film 24(silicon oxide) with respect to the fifth inter-layer insulating film 25(silicon nitride) and cause the bottom surface H′ and the side wallsurface H″ of the opening portion to retract. The width of theretraction is 3 nm or more converted to a thermal oxide film and 5 nm ormore converted to a CVD film. The upper limit is about a half of theminimum design dimension of the generation used.

At this time, at the bottom surface of the opening portion, the secondstorage node contact plug P2 is shaped to project out into the openingportion. Further, at the side wall surface of the opening portion, thefifth inter-layer insulating film 25 is shaped to project out into theopening portion.

Next, as shown in FIG. 2U, polycrystalline silicon or amorphous siliconcontaining phosphorus or another conductive impurity is deposited overthe entire surface while covering the interior of the opening portionacting as the mold of the storage node electrode by for example the CVDprocess to form a storage node electrode use layer 37 connected to thesecond storage node contact plug P2.

At this time, at the bottom surface of the opening portion, the secondstorage node contact plug P2 is shaped to project out into the openingportion, so the storage node electrode use layer 37 and the secondstorage node contact plug P2 can be connected at the top surface and theside surface of the second storage node contact plug P2. It thereforebecomes possible to reliably connect the storage node electrode uselayer 37 and the second storage node contact plug P2.

Further, at the side wall surface of the opening portion, the fifthinter-layer insulating film 25 is shaped to project out into the openingportion, so the storage node electrode use layer 37 and the fifthinter-layer insulating film 25 can be formed so as to contact each otherat the top surface and the side surface of the fifth inter-layerinsulating film 25.

Next, silicon oxide is deposited above the storage node electrode uselayer 37 while burying the opening portion acting as the mold of thestorage node electrode by for example the CVD process to form a secondstorage node forming layer 27.

Next, as shown in FIG. 2V, for example, the second storage node forminglayer 27 and the storage node electrode use layer 37 are sequentiallyetched back from above or polished from above by a CMP process to obtainthe individually divided storage node electrode 37 a and second storagenode electrode forming layer 27 a.

Next, as shown in FIG. 2W, for example fluoric acid-based wet etching isapplied to remove the first storage node forming layer 26 and the secondstorage node forming layer 27 a.

At this time, since the storage node electrode use layer 37 and thefifth inter-layer insulating film 25 were formed so as to contact eachother at the top surface and the side surface of the fifth inter-layerinsulating film 25, the storage node electrode use layer 37 and thefifth inter-layer insulating film 25 can be brought into contact withoutany gap, and the fifth inter-layer insulating film 25 acts as an etchingstopper without permeation of the etchant into the fourth inter-layerinsulating film 24.

Next, as shown in FIG. 2X, for example, the natural oxide film at thesurface of the storage node electrode 37 a is removed by fluoricacid-based wet etching, then a silicon nitride layer is formed by theRTN process and a low pressure CVD process and a silicon oxide layer isformed on the outside layer of the silicon nitride layer by thermaloxidation to form a capacitor insulating film 28 made of an NO film(stacked insulating film of nitride film and oxide film) for coveringthe storage node electrode 37 a. Alternatively, it is also possible touse a material such as tantalum oxide as the capacitor insulating film.

Next, polycrystalline silicon (or amorphous silicon) containing the sameconductivity type conductive impurity as that of the storage nodeelectrode 37 a is deposited by for example the CVD process to form theplate electrode 38, whereby a capacitor having the structure shown inFIGS. 1A and 2B is completed. As the following steps, an upperinsulating film is formed over the entire surface while covering thecapacitor etc., upper interconnections are formed according to need, andso on, whereby the intended semiconductor memory device is produced.

According to the method for producing a semiconductor memory device ofthe present embodiment, it is possible to produce a semiconductor memorydevice having a high quality storage node electrode and storage nodecontact plug enabling the prevention of connection failure between thestorage node contact plug and the storage node electrode, the preventionof the removal of the insulating film below the etching stopper, whichwas a cause of short-circuiting, etc.

For example, as shown in the sectional view of FIG. 3A and the enlargedview of the region X in FIG. 3A of FIG. 3B, even in the case where theopening portion H acting as the mold of the storage node electrodeformed in the first storage node forming layer 26 is formed deviated tothe left of the figure by the amount of the distance A, the storage nodeelectrode use layer 37 and the fifth inter-layer insulating film 25 canbe brought into contact without a gap, and it is possible to produce thesemiconductor memory device stably without permeation of the etchantinto the fourth inter-layer insulating film 24.

In the method for producing the semiconductor memory device of thepresent embodiment, it is possible to reduce the thickness of the fifthinter-layer insulating film (silicon nitride film) as the etchingstopper film and possible to reduce the total thickness of theinter-layer insulating films. By making the etching stopper filmthinner, a reduction of the stress of the insulating film can berealized, thus a DRAM with little crystal failure, for example, littleretention characteristic, can be produced.

Further, the aspect ratio of the contacts around the memory cells islowered and miniaturization becomes easy, which makes this suited tomixed mounting of a DRAM and logic circuit.

Further, it is possible to make the storage node electrode a size morethan the resolution of lithography, so a large storage capacity Cs canbe secured and the height of the capacitor can be lowered and thereforethe step difference due to the capacitor can be reduced. As a result, afurther reduction of the thickness of the insulating film is possible,the aspect ratio of the contacts around the memory cells is furtherlowered, and further miniaturization becomes easy, which makes thisfurther suited to mixed mounting of a DRAM and logic circuit.

The method for producing a semiconductor memory device of the presentinvention can be applied to any semiconductor memory device having acapacitor (storage node) such as a DRAM or VRAM having a memorycapacitor.

The method for producing a semiconductor memory device of the presentinvention is not limited to the embodiment. For example, as the storagenode electrode, amorphous silicon or polycrystalline silicon can beused.

As the shape of the capacitor, other than the cylinder type, variousshapes such as the stack type and the fin type can be applied.

Further, the structure, production method, etc. of the transistor partare not particularly limited. It is possible to adopt a variety ofstructures for example a polycide or other gate electrode or a sourceand drain diffusion layer of the LDD structure.

Further, mixed mounting with a logic LSI or other semiconductor elementor device is possible. In addition, various modifications are possiblewithin a range not out of the gist of the present invention.

Summarizing the effects of the invention, the semiconductor memorydevice of the present invention is a semiconductor memory device havinga high quality storage node electrode and storage node contact plugenabling prevention of connection failure between the storage nodecontact plug and the storage node electrode, prevention of the removalof the insulating film below the etching stopper, which is a cause ofshort-circuiting, etc.

Further, according to the method for producing a semiconductor memorydevice of the present invention, the semiconductor memory device of thepresent invention described above can be easily produced. That is, asemiconductor memory device having a high quality storage node electrodeand storage node contact plug enabling prevention of connection failurebetween the storage node contact plug and the storage node electrode,prevention of the removal of the insulating film below the etchingstopper, which is a cause of short-circuiting, etc. can be produced.

What is claimed is:
 1. A semiconductor memory device comprising aplurality of memory cells each having a memory capacitor having astorage node electrode and a transistor, comprising: a substrate, atransistor formed on said substrate, a first insulating film formed onsaid substrate covering said transistor, a storage node contact holeformed in said first insulating film and reaching a source and drainregion of said transistor, a storage node contact plug buried in saidstorage node contact hole, a storage node electrode formed connected tosaid storage node contact plug, a second insulating film formed abovesaid first insulating film in the gap portion of said storage nodeelectrodes, a capacitor insulating film formed above said storage nodeelectrode, and a plate electrode formed above said capacitor insulatingfilm, said storage node electrode and said storage node contact plugbeing formed connected at least at part of the top surface and sidesurface of said storage node contact plug, and said storage nodeelectrode and said second insulating film being formed in contact atleast at part of the top surface and the side surface of said secondinsulating film.
 2. A semiconductor memory device as set forth in claim1, wherein: a bit line is formed above the transistor through aninsulating film and said transistor and said bit line are covered bysaid first insulating film.
 3. A semiconductor memory device as setforth in claim 1, wherein said storage node electrode comprises acylinder type storage node electrode.
 4. A semiconductor memory devicecomprising a plurality of memory cells each having a memory capacitorhaving a storage node electrode and a transistor, comprising: asubstrate, a transistor formed on said substrate, a first insulatingfilm formed on said substrate covering said transistor, a storage nodecontact hole formed on said insulating film and reaching the source anddrain region of said transistor, a storage node contact plug buried insaid storage node contact hole, a storage node electrode formedconnected to said storage node contact plug, a second insulating filmformed above said first insulating film in the gap of said storage nodeelectrode, a capacitor insulating film formed above said storage nodeelectrode, and a plate electrode formed above said capacitor insulatingfilm, said storage node electrode and said second insulating film beingformed in contact at least at part of the top surface and the sidesurface of said second insulating film.
 5. A semiconductor memory deviceas set forth in claim 4, wherein: a bit line is formed above thetransistor through an insulating film and said transistor and said bitline are covered by said first insulating film.
 6. A semiconductormemory device as set forth in claim 4, wherein said storage nodeelectrode comprises a cylinder type storage node electrode.